BANGALORE, India, Jan. 6, 2026 /PRNewswire/ -- The Global Semiconductor Etch Equipment Market revenue was USD 22730 Million in 2022 and is forecast to a readjusted ...

Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND ...

デバイス性能のさらなる向上を見据え、新たな高性能材料の研究開発が進んでいる。その中でも、超微細トランジスタのゲート絶縁膜として広く使用されている強誘電性物質の酸化ハフニウムは、次世代の非揮発強誘電体メモリへの応用が近年特に注目を ...

Major processes in semiconductor wafer fabrication: 1) wafer preparation, 2) pattern transfer, 3) doping, 4) deposition, 5) etching, and 6) packaging. The process of creating semiconductors can be ...

However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer––the sheet of semiconductor material to be ...

高精度な加工が必要とされる半導体の製造過程では、異方性エッチングに向いた手法であるドライエッチングが用いられている。ドライエッチングと言えば、リアクティブ・イオン・エッチング(RIE)を指すことが多く、広義ではプラズマエッチングや ...