With photolithography not able to produce circuit lines much thinner than 100nm, a major focus of research into nanotechnology is in developing means to construct circuits that break the 100nm barrier ...
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New semiconductor etching process achieves five-fold speed improvement
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
Argonne National Labs have developed a new technique, molecular layer etching, that may help develop microelectronics and show the way beyond Moore’s Law. Molecular layer etching could enable ...
ITHACA, N.Y. — Cornell University researchers have discovered yet another method for shrinking the design rules on silicon chips. The researchers demonstrated the technique, called controlled etching ...
The global Etching Process Parts Market is entering a decade of accelerated expansion as semiconductor manufacturers scale capacity, adopt next-generation process nodes, and intensify requirements for ...
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